KMS Chongqing Institute of Green and Intelligent Technology, CAS
| Nanochannel fabrication by imprinting-induced cracks | |
Xia, Liangping1,2; Zhang, Man2; Yang, Zheng1 ; Cui, Hongliang1; Yin, Shaoyun1; Hu, Song2; Du, Chunlei1
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| 2014-02-17 | |
| 摘要 | A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. (C) 2014 AIP Publishing LLC. |
| DOI | 10.1063/1.4866155 |
| 发表期刊 | APPLIED PHYSICS LETTERS
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| ISSN | 0003-6951 |
| 卷号 | 104期号:7页码:4 |
| 通讯作者 | Du, CL (reprint author), Chinese Acad Sci, Key Lab Multiscale Mfg Technol, Chongqing Inst Green & Intelligent Technol, Chongqing 400714, Peoples R China. |
| 收录类别 | SCI |
| WOS记录号 | WOS:000332038500056 |
| 语种 | 英语 |
